Transport phenomena in liquid phase diffusion growth of silicon germanium




Armour, Neil Alexander

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Silicon Germanium, SiGe, is an important emerging semiconductor material. In order to optimize growth techniques for SiGe production, such as Liquid Phase Diffusion, LPD, or Melt Replenishment Czochralski, a good understanding of the transport phenomena in the melt is required. In the context of the Liquid Phase Diffusion growth technique, the transport phenomena of silicon in a silicon-germanium melt has been explored. Experiments isolating the dissolution and transport of silicon into a germanium melt have been conducted under a variety of flow conditions. Preliminary modeling of these experiments has also been conducted and agreement with experiments has been shown. In addition, full LPD experiments have also been conducted under varying flow conditions. Altered flow conditions were achieved through the application of a variety of magnetic fields. Through the experimental and modeling work better understanding of the transport mechanisms at work in a silicon-germanium melt has been achieved.



Crystal Growth, Silicon Germanium, Liquid Phase Diffusion, Transport Phenomena